Product Overview
Dual-channel Graphite Mold – High-purity custom solution for semiconductor processing
Made from selected high-purity graphite. Features two parallel elongated cavities for simultaneous material processing. Designed for high-temperature melting, reduction, and heat treatment with excellent thermal uniformity and low contamination risk.
Key Features
Fully customizable size, cavity depth, and mounting holes
High-purity graphite – stable performance at elevated temperatures
Dual parallel channels – higher efficiency, consistent heating
Precision machining – accurate dimensions and smooth surfaces
Excellent thermal conductivity and thermal shock resistance
Typical Applications
Semiconductor-related high-temperature fixtures
Germanium or silicon material reduction and ingot casting
High-temperature melting and holding of small metal samples
Diffusion, sintering, or heat-treatment processes
Why Choose Our Graphite
As a professional graphite manufacturer, we use carefully selected high-purity material and precision machining to ensure low particle generation and long service life. Every mold is custom-made according to your drawings or process needs.
Need a specific size or quantity? Contact us for a quote.
We focus on quality graphite solutions for semiconductor and high-temperature applications.
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